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铀薄膜有助于原子参数的测试研究,目前对铀薄膜研究的报道较少.利用超高真空磁控溅射法在单晶Si片上制备了铀薄膜.通过扫描电子显微镜(SEM)对铀薄膜的表面形貌进行了观察,利用X射线光电子能谱仪(XPS)及X射线衍射仪(XRD)对铀薄膜的表面结构及元素状态进行了分析和表征.结果表明:铀薄膜呈片状式生长,比较致密、连续,表面由铀及氧化铀组成,之下为纯铀.

Uranium film was prepared on the surface of single crystal silicon wafer by using ultra high vacuum magnetron sputtering. The surface morphology of the resulting uranium film was observed using a scanning electron microscope. The surface chemical state and phase structure of the film were analyzed by means of X-ray photoelectron spectroscopy and X-ray diffraction. Results show that the as-prepared uranium film is flake- like, compact and continuous. The surface of the film is composed of elemental U and uranium oxide, while the bulk film is composed of elemental U alone.

参考文献

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[4] 鲜晓斌.磁控溅射沉积铀薄膜组织结构研究[J].真空,2000(03):22.
[5] 鲜晓斌,吕学超,伏晓国,任大鹏.蒸发、磁控溅射沉积真空对铀薄膜组成和结构的影响[J].材料导报,2001(07):62-63,55.
[6] 鲜晓斌,吕学超,张永彬,任大鹏.磁控溅射沉积U薄膜性能研究[J].原子能科学技术,2002(04):396-398.
[7] 张延志,管卫军,帅茂兵,汪小琳,赖新春,王勤国.金属铀表面氧化动力学的X射线衍射研究[J].原子能科学技术,2006(05):529-533.
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