铀薄膜有助于原子参数的测试研究,目前对铀薄膜研究的报道较少.利用超高真空磁控溅射法在单晶Si片上制备了铀薄膜.通过扫描电子显微镜(SEM)对铀薄膜的表面形貌进行了观察,利用X射线光电子能谱仪(XPS)及X射线衍射仪(XRD)对铀薄膜的表面结构及元素状态进行了分析和表征.结果表明:铀薄膜呈片状式生长,比较致密、连续,表面由铀及氧化铀组成,之下为纯铀.
Uranium film was prepared on the surface of single crystal silicon wafer by using ultra high vacuum magnetron sputtering. The surface morphology of the resulting uranium film was observed using a scanning electron microscope. The surface chemical state and phase structure of the film were analyzed by means of X-ray photoelectron spectroscopy and X-ray diffraction. Results show that the as-prepared uranium film is flake- like, compact and continuous. The surface of the film is composed of elemental U and uranium oxide, while the bulk film is composed of elemental U alone.
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