以聚四氟乙烯(PTFE)为靶材,用射频磁控溅射方法在玻璃衬底上制备了氟碳高分子薄膜,并对其结构和表面性能进行了研究.由XPS的结果可知,构成薄膜的大分子由-CF-、-CF2-和-CF3等组分组成.随着氩气压强的增加,缺氟基团-C-增加,而-CF2-、-CF3等富氟基团以及F/C均减少;随着氮气偏压的增加,-CF-、-CF2-和-CF3以及F/C和N/C增加.同时探讨了溅射气氛对薄膜表面形貌、疏水性能及表面能的影响.
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