以N2、O2作载气,采用催化增强化学气相沉积(CECVO)法,于250~300℃和减压/常压下制得沉积于聚酰亚胺(PI)上的Pt,Pd/Pt和Pt/Pd金属双层薄膜.当使用Pd(hfac)2和Pt(COD)Me2为前驱体,在同一反应器内共沉积时只有Pt被沉积(钯配合物起催化剂作用),金属铂、钯顺序沉积可形成双层膜.经XPS和SEM分析了所得沉积膜的表面结构与相组成.结果表明:所有沉积层与PI衬底的粘附性能良好;沉积速率为70~80nm/h,钯、铂粒径分别为100nm和100~150nm.
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