(Pb,La)TiO3铁电薄膜的表面态分析

功能材料, 2001, 32(2): 149-153.

(Pb,La)TiO3铁电薄膜的表面态分析

朱基亮 ^1, , 朱建国 ^2, , 申林 ^3, , 潘宇 ^4, , 肖定全 ^5,

1.四川大学材料科学系,

2.四川大学材料科学系,

3.四川大学材料科学系,

4.四川大学材料科学系,

5.四川大学材料科学系,

基金项目: 国家高技术研究发展计划(863计划)

关键词：射频磁控溅射 , (Pb,La)TiO3 , 铁电薄膜 , EDAX , XPS

Analysis of Surface States of Ferroelectric (Pb, La) TiO3 Thin Films

利用(Pb,La)TiO3陶瓷靶材,采用射频磁控溅射技术室温淀积,其后在600℃下退火,制备了PLT铁电薄膜.通过对薄膜进行XPS和EDAX分析,发现薄膜表面富钛.与利用其它工艺技术如多离子束反应共溅射、sol-gel等技术制备的PLT铁电薄膜进行对比可以看出,利用不同技术制备的铁电薄膜,具有不同的表面态.

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材料期刊网

(Pb,La)TiO3铁电薄膜的表面态分析

Analysis of Surface States of Ferroelectric (Pb, La) TiO3 Thin Films

参考文献