不同偏压下利用多弧离子镀技术在U基体上制备了TiN薄膜.利用X射线衍射(XRD)分析了薄膜的微观组织结构,用扫描电镜(SEM)观察其表面形貌.结果表明:所得薄膜为单一TiN结构,薄膜表面平整、致密,但局部仍存在大颗粒.摩擦磨损实验测定了薄膜的磨损性能.随偏压的上升,摩擦系数由0.421变为0.401.同时利用X射线光电子能谱分析仪(XPS)对湿热腐蚀20 d后的样品进行了分析,并利用电化学极化实验在0.5μg/g Cl-溶液中测试了基体及薄膜耐蚀性能.结果表明:TiN涂层提高了贫铀的抗腐蚀性能.
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