本文用脉冲高能量密度等离子体技术，在室温条件下，成功地在ＧＣｒ１５钢表面沉积了性能良好的氮化钛薄膜。用自动划痕试验仪测量了氮化钛薄膜的结合强度。研究结果表明：表征薄膜结合强度的临界载荷有相当高的值；氮化钛薄膜的临界载荷随脉冲轰击次数、内外电极的电压变化而变化。对沉积膜结合强度的这些变化给予了理论上的解释与讨论。
The quality TiN film was deposited onto GCr15 steel substrate by the pulsed high energy density plasma technique at room temperature. The adhesive strentgh of TiN coating to GCr15 steel substrate has been satisfactorily measured using automatic scratch tester. The critical load with remarkable higher values may be available to characterize theadhesive strength of the coating. The critical load of the TiN coating was revealed to be varied with numbers of pulsed plasma, the discharge voltage between inner and outer electrodes and pressure of working gases. These have been discussed and explained on the theoretical bases. (Correspondent: YAN Fengxun, associate professor, Institute of physics, Chinese Academy of Sciences, Beijing 100080)
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