氮氧化硅薄膜材料具有优异的热力学、介电及光学性能,在微电子、光学器件等方面有着重要应用.其主要制备方法包括化学气相沉积、溅射、直接氮化/氧化及离子植入.综述了该类材料的制备方法和应用研究进展,并指出了制备方法和应用研究的发展方向.
Silicon oxynitride films have broad important applications in the areas of microelectonics and optics for their excellent thermodynamical, dielectric and optical properties. They can be fabricated through the methods of CVD,sputtering,oxynitridation and ion implantation. The research progresses and applications of silicon oxynitride films are reviewed. The research trends on fabrication and applications of silicon oxynitride films are given.
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