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采用K575X高分辨率溅射仪在单晶硅衬底上制备镍纳米催化剂薄膜.研究了高温氨气刻蚀对镍催化剂由连续薄膜转变成纳米颗粒的影响.探讨了预处理时间、温度和催化剂薄膜原始厚度等工艺参数对镍薄膜微结构的影响,得到了镍催化剂薄膜的氨预处理规律,并初步分析了氨气对其形貌变化的影响机理.研究结果表明,获得均匀、细小和高密度过渡镍金属催化剂颗粒的工艺条件是预处理时间、温度和催化剂薄膜原始厚度分别为12min、800℃和10nm.

参考文献

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