针对薄膜及镀层织构分析的特殊困难(衍射峰特宽、强度测量偶然误差严重、散焦补正困难等),基于熵最大与极密度差最小二乘优化应同步进行的原则,提出了织构分析中熵最大处理模式的新的约束条件,修正了以往约束条件与取向非负性之间的不自洽性[1],从而克服了薄膜织构定量分析的困难.模拟研究表明:新方法可以自动补偿测量偶然误差及散焦误差、应用实例指出,此法可成功进行实际镀层材料的织构定量分析。
The texture analysis in thin films and coating materials has suffered some difficulty due to the broadenling diffraction peaks, strong defocusing effect and severe stochastic errors of measured pole figures.Based on the prirciple of maximum entropy and th
参考文献
| [1] | 王沿东,徐家桢,金属学报,1995,31:B5502HeizmannJJ,LaruelleC,JApplCryst,1986,19:4673ChateignerD,GermiP,Pernet,MaterialsScienceForum,1994,157~162:13794ChateignerDetal．JApplCryst,1992,25:7665BermigG,TobischJ,HelmingK．MaterialsScienceForum,1994,157~162:976WangF,XuJZ,LiangZD．Warrendale,8thICOTOM,1987:1107LiangZD,XuJZ,WangF．TextruesandMicrostructures,1989,10:2178WenkJR,BurgeHJetal．TheEighthInternationalConferenceonTexturesofMaterials(ICOTOM8),1987:179王沿东,刘沿东,徐家桢．待发表 |
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