用动电位极化法和扫描电镜研究了工业纯铝阳极氧化膜在Na Cl溶液中的孔蚀行为.结果表明，蚀孔的生长控制机制随蚀孔的发展而发生变化，蚀孔生长 的 初期为扩散控制，然后向欧姆控制发展，在蚀孔生长的后期阶段又转为扩散控制.对蚀孔的 形貌观察发现，小孔贯穿阳极氧化膜以后优先在基体中生长，形成“半球型”的蚀孔形貌， 阳极氧化膜大部分保留在蚀孔上方形成“膜盖”，膜盖上只有一个直径很小的小孔作为蚀孔 生长的扩散通道.讨论了蚀孔的生长机制.
Pitting behavior of anodized aluminum in NaCl solut ion was studied using methods of potentiodynamic polarization and SEM.The result s show that the controlling mechanism for pitting changes with development of th e pit.The early stage and last stage of pit growth are controlled by diffusion,w hile the middle stage is controlled by ohmic action.Once a pit penetrates the an odic film,it preferentially propagates in the aluminum matrix,and hemispherical pit with a film cover above is formed.Only a small pit is present on the film co ver as the diffusion channel for pit development.The growth mechanism of pitting was discussed.
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