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简述了氮化硼的优异性能和广阔的应用前景,概述了氮化硼薄膜的制备方法,分析了薄膜制备过程中的影响因素,最后对氮化硼薄膜今后的研究方向提出展望.

参考文献

[1] Olszna A;Konwerka Hrabowska;J Lisicki M .[J].Diamond and Related Materials,1997,6:617.
[2] El-Yadouni A;Solta A;Boudrioua A et al.[J].Optical Materials,2001,17(1-2):319.
[3] Mishima O et al.[J].Science,1987,238:181.
[4] Steffen Weissmantel;Gunter Reisse .[J].Applied Surface Science,2002,197-198:331.
[5] Katsumitsu Nakamura;Tomoaki Sasaki .[J].Solid-state chemistry,2000,154:101.
[6] Orlando S;Paris G P;Santagata A .[J].Applied Surface Science,2003,208-209:575.
[7] Effiong E Ibok;Shyam Garg;Eddie Lee.VMIC Conference[C].,1991:369.
[8] 祁英昆,张溪文,郝天亮,董博,沈鸽,杜丕一,翁文剑,赵高凌,韩高荣.氮化硼光电薄膜材料的制备及其性能研究[J].材料科学与工程,2002(04):510-512,540.
[9] Hobbs KR.;Coombe RD. .Plasma-assisted deposition of BN thin films from B(N-3)(3)[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2002(1/2):162-166.
[10] Yu J;Matsumoto S .[J].Diamond and Related Materials,2004,9:1704.
[11] Horsass H;Eyhusen S;Ronning C .[J].Diamond and Related Materials,2004,4-8:1103.
[12] Choi Byungjing .[J].Materials Research Bulletin,1999,34(14-15):2215.
[13] 张生俊,陈光华.热丝辅助ECR CVD制备cBN薄膜[J].无机材料学报,2003(04):947-950.
[14] 田晶泽,吕反修,夏立芳.脉冲直流偏压增强的高质量立方氮化硼薄膜的合成[J].物理学报,2001(11):2258-2262.
[15] 乐永康.立方氮化硼薄膜的制备及其光学应用展望[J].光学仪器,2004(02):147-150.
[16] Djouadi MA;Vasin A;Nouveau C;Angleraud B;Tessier PY .Deposition of boron nitride films by PVD methods: transition from h-BN to c-BN[J].Surface & Coatings Technology,2004(0):174-177.
[17] Eyhusen S;Gerhards I;Hofsass H .[J].Diamond and Related Materials,2003,10-11:1877.
[18] Dǎring J E;Guangnan L;Stock H R .[J].Diamond and Related Materials,1999,8:1697.
[19] Ding XZ.;Zeng XT.;Xie H. .Cubic boron nitride films deposited by unbalanced RF magnetron sputtering and pulsed DC substrate bias[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2003(1/2):22-27.
[20] Bello I;Chan C Y;Zhang W J .[J].Diamond and Related Materials,2005,14:1154.
[21] Li Weiqing;Gu Guangrui;Li Yingai et al.[J].Applied Surface Science,2005,242:207.
[22] Shigco Kutake;Takaya Hasegawa;Kazwtaka Kamaiya et al.[J].Applied Surface Science,2003,216:72.
[23] Kurooka S;Ikeda T;Kohama K et al.[J].Surface and Coatings Technology,2003,166:117.
[24] Kurooka S;Ikeda T;Tanaka A .[J].Nuclear Instruments and Methods in Physics Research,2003,206:1088.
[25] Yamamoto K;Keunccke M;Bcwilogua K .[J].Thin Solid Films,2000,33:327.
[26] Bcwilogua K;Keunccke M;Weigel K et al.[J].Thin Solid Films,2004,8691:86.
[27] He Qi;Li Chengming;Craig Frankel et al.[J].Thin Solid Films,2005,474(1-2):96.
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