使用具有不同非平衡度的磁控管直流磁控溅射技术沉积CrNx镀层,并用Langmuir探针诊断、高斯仪测量、Ansys软件模拟等手段进行表征,研究了磁场非平衡度对溅射等离子体的空间分布状态以及CrNx镀层的微观结构、硬度及摩擦性能的影响.结果表明:低非平衡度磁控管(K为2.78)将多数离子束缚在靶材表面大约6 cm范围内,而对于高非平衡度磁控管(K为6.41)则在此区域没有类似的高密度等离子体存在.随着磁场非平衡度的增大,CrNx镀层的厚度递增,物相结构也从Cr+Cr2N依次向Cr+Cr2N+CrN和Cr2N+CrN转化,且镀层的平整度和致密性随之明显改善.同时,CrNx镀层的硬度随着非平衡度的增大而提高,摩擦系数则随之减小.
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