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  4. 过渡金属氮氧化物制备方法的研究进展

材料导报, 2012, 26(9): 27-31.

过渡金属氮氧化物制备方法的研究进展

汪广进 1, , 余意 2, , 程凤 3, , 梁聪 4, , 徐甜 5, , 潘牧 6,

1.武汉理工大学材料复合新技术国家重点实验室,武汉430070

2.武汉理工大学材料复合新技术国家重点实验室,武汉430070

3.武汉理工大学材料复合新技术国家重点实验室,武汉430070

4.武汉理工大学材料复合新技术国家重点实验室,武汉430070

5.武汉理工大学材料复合新技术国家重点实验室,武汉430070

6.武汉理工大学材料复合新技术国家重点实验室,武汉430070

基金项目:   国家高技术研究发展计划(863)重大项目(2008AA11A106)  

关键词： 过渡金属氮氧化物 , 溅射法 , 化学气相沉积法 , 化学合成法

Research Progress of Preparation Methods for Transition Metal Nitrogen Oxides

综述了近10年来过渡金属氮氧化物的制备方法,主要包括溅射法(磁控溅射法和等离子体溅射法)、化学气相沉积法(等离子体增强化学气相沉积法、低压化学气相沉积法和催化化学气相沉积法)和化学合成法(氨解法、原位热解法和氮化物氧化法)三大类,并总结了常用的溅射法和化学气相沉积法合成技术参数.

参考文献

[1] Nakano Y;Morikawa T;Ohwaki T;Taga Y .Deep-level optical spectroscopy investigation of N-doped TiO2 films[J].Applied physics letters,2005(13):2104-1-2104-3-0.
[2] Gang Liu;Hua Min Zhang;Mei Ri Wang;He Xiang Zhong;Jian Chen .Preparation, characterization of ZrO_xN_y/C and its application in PEMFC as an electrocatalyst for oxygen reduction[J].Journal of Power Sources,2007(2):503-510.
[3] J.H. Hsieh;Chuan Li;H.C. Liang .Structures and photocatalytic behavior of tantalum-oxynitride thin films[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2011(15):4699-4704.
[4] J.H. Hsieh;C.C. Chang;J.S. Cherng;F.Y. Hsu .Optical properties and hydrophilic behaviors of TaO_xN_y thin films with and without rapid thermal annealing[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2009(17):4711-4714.
[5] Chappe JM;Carvalho P;Lanceros-Mendez S;Vasilevskiy MI;Vaz F;Machado AV;Fenker M;Kappl H;Parreira NMG;Cavaleiro A .Influence of air oxidation on the properties of decorative NbOxNy coatings prepared by reactive gas pulsing[J].Surface & Coatings Technology,2008(11):2363-2367.
[6] Characterization of N-doped TiO_2 films prepared by reactive sputtering using air/Ar mixtures[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2009(5):1369.
[7] Chiu S M et al.Photocatalytic activity of doped TiO2 coatings prepared by sputtering deposition[J].Journal of Materials Processing Technology,2007,192-193:60.
[8] Lindgren T;Lu J;Hoel A;Granqvist CG;Torres GR;Lindquist SE .Photo electrochemical study of sputtered nitrogen-doped titanium dioxide thin films in aqueous electrolyte[J].Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion,2004(1/4):145-157.
[9] Yonekura, D.;Fujikawa, K.;Murakami, R.-I. .Influence of film structure on gas barrier properties of SiO_xN_y films[J].Surface & Coatings Technology,2010(1):168-173.
[10] SiO_xN_y thin films with variable refraction index: Microstructural, chemical and mechanical properties[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2010(14):p.4548.
[11] V. Godinho;V.N. Denisov;B.N. Mavrin;N.N. Novikova;E.A. Vinogradov;V.A. Yakovlev;C. Fernandez-Ramos;M.C. Jimenez de Haro;A. Fernandez .Vibrational spectroscopy characterization of magnetron sputtered silicon oxide and silicon oxynitride films[J].Applied Surface Science,2009(1):156.
[12] Waite M M;Shah S I .Target poisoning during reactive sputtering of silicon with oxygen and nitrogen[J].Materials Science and Engineering B,2007,140(1-2):64.
[13] Reactive Pulse Magnetron Sputtered Sio_xn_y Coatings On Polymers[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2009(10):3110-3114.
[14] Moura C;Carvalho P;Vaz F;Cunha L;Alves E .Raman spectra and structural analysis in ZrOxNy thin films[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2006(3):1132-1137.
[15] Carvalho P;Fernandes AC;Rebouta L;Vaz F;Cunha L;Kreissig U;Barradas NP;Ramos AR;Alves E .Compositional and structural changes in ZrOxNy films depending on growth condition[J].Nuclear Instruments and Methods in Physics Research, Section B. Beam Interactions with Materials and Atoms,2006(0):458-461.
[16] Mohamed SH;Anders A;Montero I;Galan L .Structural and optical evaluation of WOxNy films deposited by reactive magnetron sputtering[J].The journal of physics and chemistry of solids,2007(12):2227-2232.
[17] Akimitsu Ishihara;Shotaro Doi;Shigenori Mitsushima;Ken-ichiro Ota .Tantalum (oxy)nitrides prepared using reactive sputtering for new nonplatinum cathodes of polymer electrolyte fuel cell[J].Electrochimica Acta,2008(16):5442-5450.
[18] L.Q. Zhu;Q. Fang;X.J. Wang;J.P. Zhang;M. Liu;G. He;L.D. Zhang .Structural, Optical Properties And Band Gap Alignments Of Zro_xn_y Thin Films On Si (100) By Radio Frequency Sputtering At Different Deposition Temperatures[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2008(17):5439-5444.
[19] F.L. Wong;M.Y. Chan;S.L. Lai;M.K. Fung;K.H. Lai;W.M. Tsang;T.W. Ng;C.O. Poon;C.S. Lee;S.T. Lee .Lifetime improvement of organic light-emitting diodes using silicon oxy-nitride as anode modifier[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2008(22):8195-8198.
[20] Rebib F et al.SiOx Ny thin films deposited by reactive sputtering:Process study and structural characterisation[J].Thin Solid Films,2007,515(7-8):3480.
[21] Rebib F;Tomasella E;Aida S;Dubois M;Cellier J;Jacquet M .Electrical behaviour of SiOxNy thin films and correlation with structural defects[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2006(15):5607-5610.
[22] Rebib, F;Tomasella, E;Dubois, M;Cellier, J;Sauvage, T;Jacquet, M .Structural and optical investigations of SiOxNy thin films deposited by RF sputtering[J].Surface & Coatings Technology,2005(1/4):330-333.
[23] Balaceanu M;Braic V;Braic M;Kiss A;Zoita CN;Vladescu A;Drob P;Vasilescu C;Dudu D;Muresanu O .Structural, mechanical and corrosion properties of TiOxNy/ZrOxNy multilayer coatings[J].Surface & Coatings Technology,2008(11):2384-2388.
[24] Mohamed S H;Shaaban E R .Investigation of the refractive index and dispersion parameters of tungsten oxynitride thin films[J].Materials Chemistry and Physics,2010,121(1-2):249.
[25] S. Kment;P. Kluson;Z. Hubicka;J. Krysa;M. Cada;I. Gregora;A. Deyneka;Z. Remes;H. Zabova;L. Jastrabik .Double hollow cathode plasma jet-low temperature method for the TiO_(2-x)N_x photoresponding films[J].Electrochimica Acta,2010(5):1548-1556.
[26] Zhu M;Shi XJ;Chen P;Liu WL;Wong M;Lin CL;Chu PK .Formation of silicon on plasma synthesized SiOxNy and reaction mechanism[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2005(1/4):89-95.
[27] Chambers SA;Cheung SH;Shutthanandan V;Thevuthasan S;Bowman MK;Joly AG .Properties of structurally excellent N-doped TiO2 rutile[J].Chemical Physics: A Journal Devoted to Experimental and Theoretical Research Involving Problems of Both a Chemical and Physical Nature,2007(1-3):43-56.
[28] Yang M C;Yang T S;Wong M S .Nitrogen-doped titanium oxide films as visible light photocatalyst by vapor deposition[J].Thin Solid Films,2004,469-470:1.
[29] Miao L et al.The improvement of optical reactivity for TiO2 thin films by N2-H2 plasma surface-treatment[J].Journal of Crystal Growth,2004,260(1-2):118.
[30] Chou HY;Lee EK;You JW;Yu SS .Photo-induced hydrophilicity of TiO2-N-x(x) thin films on PET plates[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2007(2/4):189-192.
[31] Hong YC;Bang CU;Shin DH;Uhm HS .Band gap narrowing of TiO2 by nitrogen doping in atmospheric microwave plasma[J].Chemical Physics Letters,2005(4-6):454-457.
[32] S.W. King;J.A. Gradner .Intrinsic stress fracture energy measurements for PECVD thin films in the SiO_xC_yN_z:H system[J].Microelectronics and reliability,2009(7):771-781.
[33] Shim J;Yoon HG;Na SH;Kim I;Kwak S .Silicon oxynitride gas barrier coatings on poly(ether sulfone) by plasma-enhanced chemical vapor deposition[J].Surface & Coatings Technology,2008(13):2844-2849.
[34] Matsuda T;Furuta M;Hiramatsu T;Li CY;Furuta H;Hokari H;Hirao T .Influence of amorphous buffer layers on the crystallinity of sputter-depo sited undoped ZnO films[J].Journal of Crystal Growth,2008(1):31-35.
[35] Criado, D;Zuniga, A;Pereyra, I .Structural and morphological studies on SiOxNy thin films[J].Journal of Non-Crystalline Solids,2008(19/25):2809-2815.
[36] Albertin, KF;Pereyra, I .Improved effective charge density in MOS capacitors with PECVD SiOxNy dielectric layer obtained at low RF power[J].Journal of Non-Crystalline Solids,2008(19/25):2646-2651.
[37] Hussein M G et al.Optimization of plasma-enhanced chemical vapor deposition silicon oxynitride layers for integrated optics applications[J].Thin Solid Films,2007,515(7-8):3779.
[38] Criado D;Alayo MI;Fantini MCA;Pereyra I .Local bonding in PECVD-SiOxNy films[J].Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites,2006(9/20):1298-1302.
[39] Albertin KF;Pereyra I .Correlation of PECVD SiOxNy dielectric layer structural properties and Si/SiOxNy/Al capacitors interface electrical properties[J].Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites,2006(9/20):1438-1443.
[40] Lee, JH;Jeong, CH;Lim, JT;Jo, NG;Kyung, SJ;Yeom, GY .Properties of SiOxNy thin film deposited by low temperature plasma enhanced chemical vapor deposition using TEOS-NH3-O-2-N-2 gas mixtures[J].Surface & Coatings Technology,2005(1/4):680-685.
[41] Kohli S;Theil JA;Dippo PC;Ahrenkiel RK;Rithner CD;Dorhout PK .Chemical, optical, vibrational and luminescent properties of hydrogenated silicon-rich oxynitride films[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2005(1):89-97.
[42] Pereyra I;Fantini MCA;Alayo MI;Oliveira RAR;Ribeiro M;Scopel WL .Evidence of clusters size-dependent photoluminescence on silicon-rich silicon oxynitride films[J].Materials Science & Engineering, B. Solid-State Materials for Advanced Technology,2004(2/3):116-119.
[43] Lopes AT;Carreno MNP .Membranes of SiOxNy with 3D topography formed by PECVD for MEMS applications[J].Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites,2004(0):788-792.
[44] Józwik M et al.Optomechanical characterisation of compressively prestressed silicon oxynitride films deposited by plasma-enhanced chemical vapour deposition on silicon membranes[J].Thin Solid Films,2004,468(1-2):84.
[45] Criado D;Alayo MI;Pereyra I;Fantini MCA .Structural analysis of silicon oxynitride films deposited by PECVD[J].Materials Science & Engineering, B. Solid-State Materials for Advanced Technology,2004(2/3):123-127.
[46] V. Desmaris;J.Y. Shiu;N. Rorsman;H. Zirath;E.Y. Chang .Influence of oxynitride (SiO_xN_y) passivation on the microwave performance of AlGaN/GaN HEMTs[J].Solid-State Electronics,2008(5):632-636.
[47] Lee J H et al.SiOxNy thin film deposited by plasma enhanced chemical vapor deposition at low temperature using HMDS-O2-NH3-Ar gas mixtures[J].Surface and Coatings Technology,2007,201(9-11):4957.
[48] Lee JH;Jeong CH;Kim HB;Lim JT;Kyung SJ;Yeom GY .Characteristics of SiOxNy films deposited by inductively coupled plasma enhanced chemical vapor deposition using HMDS/NH3/O-2/Ar for water vapor diffusion barrier[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2006(3):917-921.
[49] Physico-chemical, structural and physical properties of hydrogenated silicon oxinitride films elaborated by pulsed radiofrequency discharge[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2010(15):p.4142.
[50] Halova E et al.LPCVD-silicon oxynitride films:Interface properties[J].Microelectronics Reliability,2005,45(5-6):982.
[51] Modreanu M et al.Investigation on optical and microstructural properties of photoluminescent LPCVD SiOxNy thin films[J].Optical Materials,2001,17(1-2):145.
[52] Ogawa Y;Ohdaira K;Oyaidu T;Matsumura H .Protection of organic light-emitting diodes over 50000 hours by Cat-CVD SiNx/SiOxNy stacked thin films[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2008(5):611-614.
[53] Oyaidu T;Ogawa Y;Tsurumaki K;Ohdaira K;Matsumura H .Formation of gas barrier films by Cat-CVD method using organic silicon compounds[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2008(5):604-606.
[54] Chen SF;Liu XQ;Liu YZ;Cao GY .The preparation of nitrogen-doped TiO2-xNx photocatalyst coated on hollow glass microbeads[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2007(6):3077-3082.
[55] Y.Q. Wang;X.J. Yu;D.Z. Sun .Synthesis, characterization, and photocatalytic activity of TiO_(2-x)N_x nanocatalyst[J].Journal of hazardous materials,2007(1/2):328-333.
[56] Shao G S;Zhang X J;Yuan Z Y .Preparation and photocatalytic activity of hierarchically mesoporous-macroporous TiO2-xNx[J].Applied Catalysis B:Environmental,2008,82(3-4):208.
[57] Guisheng Li;Jimmy C. Yu;Dieqing Zhang .A mesoporous TiO2-xNx photocatalyst prepared by sonication pretreatment and in situ pyrolysis[J].Separation and Purification Technology,2009(2):152-157.
[58] Cui X;Ma M;Zhang W;Yang YC;Zhang ZJ .Nitrogen-doped TiO2 from TiN and its visible light photoelectrochemical properties[J].Electrochemistry communications,2008(3):367-371.
[59] Brundabana Naik;Satyabadi Martha;KM. Parida .Facile fabrication of Bi_2O_3/TiO_(2-x)N_x nanocomposites for excellent visible light driven photocatalytic hydrogen evolution[J].International journal of hydrogen energy,2011(4):2794-2802.
[60] Parida, K.M.;Naik, B. .Synthesis of mesoporous TiO_(2 - x)N_x spheres by template free homogeneous co-precipitation method and their photo-catalytic activity under visible light illumination[J].Journal of Colloid and Interface Science,2009(1):269-276.
[61] Jang JS;Kim HG;Ji SM;Bae SW;Jung JH;Shon BH;Lee JS .Formation of crystalline TiO2-xNx and its photocatalytic activity[J].International Journal of Quantum Chemistry,2006(4):1067-1075.
[62] Farkas, B;Budai, J;Kabalci, I;Heszler, P;Geretovszky, Z .Optical characterization of PLD grown nitrogen-doped TiO2 thin films[J].Applied Surface Science,2008(11):3484-3488.
[63] Lei Zhao;Qing Jiang;Jianshe Lian .Visible-light Photocatalytic Activity Of Nitrogen-doped Tio_2 Thin Film Prepared By Pulsed Laser Deposition[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2008(15):4620-4625.
[64] Mohamed, S.H.;Raaif, M. .Effects of thickness and rf plasma oxidizing on structural and optical properties of SiO_xN_y thin films[J].Surface & Coatings Technology,2010(2):525-532.
[65] Liu G;Li F;Chen ZG;Lu GQ;Cheng HM .The role of NH3 atmosphere in preparing nitrogen-doped TiO2 by mechanochemical reaction[J].International Journal of Quantum Chemistry,2006(1):331-335.
[66] Shifu C et al.The preparation of nitrogen-doped photocatalyst TiO2-xNx by ball milling[J].Chemical Physics Letters,2005,413(4-6):404.
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