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目的：研究酸(HF 和 HNO3)、碱(NaOH)腐蚀液对晶体硅制绒的影响。方法通过改变 NaOH浓度、异丙醇浓度、腐蚀时间研究单晶硅片腐蚀,通过改变酸溶液浓度比研究多晶硅片腐蚀,通过分析微观形貌及表面反射率等考察制备晶体硅制绒工艺参数。结果单晶硅最佳的腐蚀液配比为：NaOH 质量浓度15 g / L,热碱温度80℃,异丙醇体积分数15%~20%,腐蚀时间10 min。在最优化参数下,晶体硅绒表面金字塔大小均匀,高度约为5μm,相邻金字塔间彼此相连,硅表面反射率降低至15%。在 V(HF)：V(HNO3)： V(CH3 COOH)=10：1：10,腐蚀速率为2μm/ min 时,晶体硅绒表面呈现较好的沟壑状绒面结构。结论溶液酸碱性的强弱和异丙醇对晶体硅制绒有较大影响,并且直接影响晶体硅的表面反射率。

Objective To study the effect of the mixture solution of NaOH, HF and HNO3 on the texture of crystalline silicon wafers. Methods The monocrystalline silicon wafer was corroded by changing NaOH concentration, isopropyl alcohol (IPA) con-centration and corrosion time. The polycrystalline silicon wafer (Poly-Si) was corroded by changing the concentration of acid solu-tion. The texture was analyzed by means of the SEM images and the surface reflectance of silicon. Results The optimum corrosion parameters were 15 g/ L for NaOH, 15% ~ 20% for IPA volume fraction, 10 minutes for corrosion time at 80 ℃ for thermokalite. At these optimized parameters, the size of pyramids was even with height of about 5 μm. The adjacent pyramids were linked to each other and the surface reflectance of silicon was reduced to 15% . The corrosion rate was 2 μm/ min at the mixture solution of V(HF) : V(HNO3 ) : V(CH3 COOH)= 10 : 1 : 10, and the texture showed like ravine. Conclusion The acid-base property of the solution and the addition of IPA have significant influence on the texture of crystalline silicon and directly affect the surface reflec-tance of silicon.