欢迎登录材料期刊网

材料期刊网

高级检索

Aligned carbon nanotubes (CNTs) were prepared on Ni-coated Ni substrate by microwave plasma chemical vapor deposition (MWPCVD) with a mixture of methane and hydrogen gases at temperature of 550℃.The experimental results show a direct correlation between the alignment of CNTs and the density of the catalyst particles at low temperature.When the particle density is high enough,among CNTs there are strong interactions that can inhibit CNTs from growing randomly.The crowding effect among dense CNTs results in the aligned growth of CNTs at low temperature.

参考文献

[1] P.Chen;J.Lin;K.L.Tan .Carbon nanotubes: a future material of life[J].IUBMB life,2000(2):105-108.
[2] C Dekker .Carbon Nanotubes as Molecular Quantum Wires[J].PHYSICS TODAY,1999,52:22.
[3] B I Yakobson;R E Smalley .Fullerene Nanotubes:C1000000 and Beyond[J].American Scientist,1997,85:324.
[4] R F Service .Superstrong Nanotubes Show They Are Smart,Too[J].Science,1998,281:940.
[5] W Z Li;S S Xie;L X Qian et al.Large Scale Synthesis of Aligned Carbon Nanotubes[J].Science,1996,274:1701.
[6] Z F Ren;Z P Huang;J W Xu et al.Synthesis of Large Arrays of Well-aligned Carbon Nanotubes on Glass[J].Science,1998,282:1105.
[7] Y C Choi;D J Bae;Y H Lee et al.Growth of Carbon Nanotubes by Microwave Plasma-enhanced Chemical Vapor Deposition at Low Temperature[J].Journal of Vacuum Science and Technology A-Vacuum Surfaces and Films,2000,18:1864.
[8] H Murakami;M Hirakawa;C Tanaka et al.Field Emission from Well-aligned,Patterned,Carbon Nanotube Emitters[J].Applied Physics Letters,2000,76:1776.
[9] Y Chen;D T Shaw;L Guo .Field Emission of Different Oriented Carbon Nanotubes[J].Applied Physics Letters,2000,76:2469.
[10] C Bower;W Zhu;S Jin et al.Plasma-induced Alignment of Carbon Nanotubes[J].Applied Physics Letters,2001,77:830.
[11] S G Wang;J H Wang;Y Qin .Synthesis of Carbon Nanotubes by Microwave Plasma Chemical Vapor Deposition at Low Temperature[J].化学学报,2002,60:957.
[12] L. C. Qin;D. Zhou;A. R. Krauss .Growing carbon nanotubes by microwave plasma-enhanced chemical vapor deposition[J].Applied physics letters,1998(24/26):3437-3439.
上一张 下一张
上一张 下一张
计量
  • 下载量()
  • 访问量()
文章评分
  • 您的评分:
  • 1
    0%
  • 2
    0%
  • 3
    0%
  • 4
    0%
  • 5
    0%