疏水型介孔氧化硅薄膜的制备与研究

材料导报, 2005, 19(3): 106-108.

1.同济大学波耳固体物理研究所,上海,200092;盐城工学院基础部,盐城,224003

2.同济大学波耳固体物理研究所,上海,200092

3.同济大学波耳固体物理研究所,上海,200092

4.同济大学波耳固体物理研究所,上海,200092

基金项目: 上海市科委国际合作项目(02SL0010) 上海市自然科学基金(02ZE14101) 国家高技术研究发展计划(863计划)(2002AA842052) 上海市学科建设项目国家自然科学基金(20133040)

Preparation and Investigation of Hydrophobic Mesoporous Silica Films

报道了一种新型疏水型介孔氧化硅薄膜的制备方法.用红外光谱、小角XRD、原子力显微镜对样品进行了表征,并采用椭偏仪和阻抗分析仪测量薄膜的折射率和介电常数.该薄膜具有很低的介电常数和较好的机械强度,是一种可用于微电子工业、极富应用前景的低介电常数材料.

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