为了进一步探讨离子束溅射铜钨薄膜的结构,在铁片上离子束溅射铜钨薄膜,研究了轰击离子束能量及低能辅助轰击方式对薄膜相结构和厚度的影响.结果表明:随轰击铜靶离子束能量增加,钨由近似非晶亚稳态转变成晶态;由于溅射粒子落到基片前的反射效应,薄膜中间比边缘薄,且随轰击铜靶离子束能量增加,薄膜变薄到一定程度时开始增厚;当使用低能辅助轰击时,原子喷丸效应使薄膜难以沉积.
参考文献
| [1] | Paturaud C;Farges G;Sainte Catherine M C et al.Influence of sputtering gases on the properties of magnetron sputtered tungsten films[J].Surface and Coatings Technology,1996,86/87(01):388-393. |
| [2] | Ligot J;Benayoun S;Hantzpergue J J et al.Sputtered tungsten films on polyimide on application for X-ray masks[J].Solid-State Electronics,1999,43:1075-1081. |
| [3] | Liu BX.;Zhang Q.;Lai WS. .Irradiation induced amorphization in metallic multilayers and calculation of glass-forming ability from atomistic potential in the binary metal systems [Review][J].Materials Science & Engineering, R. Reports: A Review Journal,2000(1/2):1-48. |
| [4] | C.H. Lin;J.P. Chu;T. Mahalingam .Thermal stability of sputtered copper films containing dilute insoluble tungsten: Thermal annealing study[J].Journal of Materials Research,2003(6):1429-1434. |
| [5] | Auciello O;Chevacharoenkul S;Amenn M S et al.Controlled ion beam sputter deposition of W/Cu/W layered films for microelectronic applications[J].Journal of Vacuum Science and Technology A:Vacuum Surfaces and Films,1991,9(03):625-631. |
| [6] | Ono H;Nakano T;Ohta T .Diffusion barrier effects of transition metals for Cu/M/Si multilayers (M= Cr,Ti,Nb,Ta,W)[J].Applied Physics Letters,1994,64(12):1511-1513. |
| [7] | 范毓殿,周志烽.薄膜溅射沉积过程中的原子喷丸效应[J].真空科学与技术,1996(04):235-241. |
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