采用交流微弧氧化法于Na2SiO3-KOH-(NaPO3)6。溶液中在Ti6A14V表面形成了氧化物陶瓷膜.研究了微弧氧化电压与频率对陶瓷膜的生长速率、组织形貌和相组成的影响.结果表明:随电压的升高或频率的减小,膜层的生长速率增加,膜层的表面质量变得粗糙.相对致密均匀的膜层主要由TiO2(锐钛矿相及金红石相)相组成,电压与频率电参数影响膜层的相组成,随电压的升高和频率的减小,膜层中锐钛矿相TiO2的相对含量减小,金红石相TiO2的相对含量增加,并成为主晶相.
Ceramic oxide coatings were formed on Ti6Al4V alloy surface by Microarc Oxidation(MAO) in Na2SiO3-KOH-(NaPO3)6 solution using an AC power supply. The effects of voltage and
frequency of the power on growth kinetics, microstructure and phase constitute of the coatings were studied. The results show: with voltage
increasing or frequency decreasing, the growth rate of the coatings increases, but the surface morphology becomes coarser. The as-deposited
coatings are relatively dense and uniform, mainly composed of anatase and rutile TiO2. The phase constitute in the coatings depends on electrical
parameters of voltage and frequency. With voltage increasing or frequency decreasing, the content of anatase TiO2 decreases, while rutile TiO2
increases and becomes the predominant phase.
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