研究开发了一种低温、快速抛光化学气相沉积(CVD)金刚石厚膜的新技术,该技术是利用金刚石(C)和溶碳活性很高的稀土金属铈(Ce)和过渡金属锰(Mn)所熔炼出的Ce-Mn合金之间的热化学反应,在一定的工艺条件下对金刚石厚膜进行有效的抛光.详细讨论了合金组成对抛光速率和表面粗糙度(Ra)的影响,并且用扫描电镜和拉曼光谱对抛光后的膜表面进行了表征.结果表明:Mn含量较低的合金从抛光率上和抛光效果上考虑都更有利于获得良好抛光的金刚石厚膜,Ce-3%Mn原子比组成的合金,在660℃、抛光2 h的实验条件下,使膜的粗糙度由10.8490 μm降低到3.6826 μm,抛光速率达到37.5 μm/h.适量Mn的加入在降低抛光温度的同时仍然可以保证良好的抛光效果,优化了热化学抛光的工艺,而且该抛光技术不会破坏金刚石厚膜质量.
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