Abnormal saturation magnetization dependency on W content for Co-W thin films

金属学报(英文版), 2010, 23(1): 8-12.

^1, , ^2, , ^3, , ^4, , ^5, , ^6, , ^7,

1.Key Laboratory for Anisotropy and Texture of Materials(Ministry of Education),Northeastern University,Shenyang 110004,China

2.Key Laboratory for Anisotropy and Texture of Materials(Ministry of Education),Northeastern University,Shenyang 110004,China

3.Key Laboratory for Anisotropy and Texture of Materials(Ministry of Education),Northeastern University,Shenyang 110004,China

4.Key Laboratory for Anisotropy and Texture of Materials(Ministry of Education),Northeastern University,Shenyang 110004,China

5.Key Laboratory for Anisotropy and Texture of Materials(Ministry of Education),Northeastern University,Shenyang 110004,China

6.Key Laboratory for Anisotropy and Texture of Materials(Ministry of Education),Northeastern University,Shenyang 110004,China

7.Graduate School of Engineering,Tohoku University,Sendai 980-8579,Japan

基金项目: 国家自然科学基金(50671020) 教育部科学技术研究项目(108039)

Abnormal saturation magnetization dependency on W content for Co-W thin films

Bo YANG ^1, , Gaowu QIN ^2, , Weili PEI ^3, , Yuping REN ^4, , Na XIAO ^5, , Xiang ZHAO ^6, , Katsunari OIKAWA ^7,

1.Key Laboratory for Anisotropy and Texture of Materials(Ministry of Education),Northeastern University,Shenyang 110004,China

2.Key Laboratory for Anisotropy and Texture of Materials(Ministry of Education),Northeastern University,Shenyang 110004,China

3.Key Laboratory for Anisotropy and Texture of Materials(Ministry of Education),Northeastern University,Shenyang 110004,China

4.Key Laboratory for Anisotropy and Texture of Materials(Ministry of Education),Northeastern University,Shenyang 110004,China

5.Key Laboratory for Anisotropy and Texture of Materials(Ministry of Education),Northeastern University,Shenyang 110004,China

6.Key Laboratory for Anisotropy and Texture of Materials(Ministry of Education),Northeastern University,Shenyang 110004,China

7.Graduate School of Engineering,Tohoku University,Sendai 980-8579,Japan

Keywords： Magnetic recording media

A series of hexagonal close-packed (HCP) Co-W thin films were deposited by sputtering on surface oxidized silicon substrates at 300 ℃. A linear dependency of saturationmagnetization (M_s) on W content was found up to about 9 at. pct W, and then it underwent an increased M_s vs. W content curve as compared to the initial linear dependency. The thermal magnetization technique was used to confirm that the increased M_s behaviour is correlated to the phase separation of the Co-W thin films.The phase separation behaviour was also found to be dependent on W content and the reason was discussed in detail. Finally an interesting composition range was suggested to be about 13 at. pct-17 at. pct W for the Co-W thin films, in which they exhibit much higher magnetic anisotropy energy than Co-Cr thin films and improved phase separation.

参考文献

[1]	G. W. Qin;K. Oikawa;M. Sato;O. Kitakami;Y. Shimada;K. Fukamichi;K. Ishida .Co-Mo and Co-Mo-Cr Alloy Thin Films Promising for Magnetic Recording[J].IEEE Transactions on Magnetics,2005(2):918-920.

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Abnormal saturation magnetization dependency on W content for Co-W thin films

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