用FS-MS模型研究了Ni/Al纳米多层膜的界面粗化行为对周期数n、Ni:Al调制比R和调制波长L的依赖性与薄膜电阻率ρ和镜面反射系数P的演变规律。结果表明：随着n减小，薄膜电阻率ρ基本恒定，即多层膜界面粗化行为对调制周期数不存在依赖性；而随着薄膜特征尺度R与L减小，出现电阻率ρ异常增加和P明显减小的变化过程。P对薄膜特征尺度的依赖关系反映了多层膜界面粗化行为的尺寸效应，即多层膜界面非对称的互扩散行为只在低调制比与低调制波长尺度下加剧，此时界面互促效应凸现。在高于临界调制波长和调制比情况下，互促效应弱化，薄膜界面扩散行为不明显。
In addition to the resistivity (ρ) and the specular reflection coefficient (P), interface roughening of Ni/Al nanomultilayers deposited by magnetron sputtering as a function of the number of bilayers (n), Ni:Al modulated ratio (R) and modulated period (L) have been characterized by Fuchs-Sondheimer(FS)- Mayadas-Shatzkes (MS) model. The results show that resistivity of multilayers was independent of the number of bilayers. With decreasing of R and L, the resistivity increased and the specular reflection coefficient decreased. The observed scale dependence of the specular reflection coefficient reflected the size effect in the interface roughening of metal nanomultilayers. Due to the nonsymmetrical interdiffusion behavior, the mutual promotion effect in the interfaces only displayed at the lower R and smaller L. Once the length scale was upon a critical value, this effect turned to be weakened and the interfacial diffusion became invisible.
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| [1] | |
| [2] | |
| [3] | |
| [4] | |
| [5] | |
| [6] | |
| [7] |
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