研究了偶联剂(KH-560)和偶联剂(KH-560)-增容剂(PP-g-MAH)的增容机理.采用扫描电镜观察纳米SiO2粉体在聚合物PP基体中的分散和界面作用来探讨纳米SiO2粉体与PP的相容机理.并建立了PP/纳米SiO2粉体共混体系的相容性机理的物理模型.
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