HfO2薄膜的结构和光学性能与反应溅射时使用的气压有很强的依赖关系.薄膜的晶粒生长取向、生长速率和折射率明显受溅射气压的影响.所有的薄膜均为单斜相,晶粒尺寸在纳米量级.薄膜的折射率在1.92～2.08范围内变化,透过率大于85％.结果表明,这些HfO2薄膜很适宜用作增透膜或者高反膜.此外,通过Tauc公式推出光学带隙在5.150～5.433eV范围内变化,表明样品是良好的绝缘体.
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