低温等离子体技术用于粉体表面处理具有工艺简单、无需溶剂、节能高效等特点.等离子体处理粉体表面利用的放电形式从真空放电到空气压力下的气体放电;范围从无机粉体的表面处理到纳米粉体、有机粉体的表面处理都有涉及.评述了国内外利用等离子体对无机粉体、有机粉体低温等离子体表面处理技术的进展.
参考文献
[1] | Kogelschatz U. .Dielectric-barrier discharges: Their history, discharge physics, and industrial applications [Review][J].Plasma Chemistry and Plasma Processing,2003(1):1-46. |
[2] | 孟胨;钟少锋;熊新阳 .[J].物理,2006,35(02):140. |
[3] | Wagner HE.;Brandenburg R.;Kozlov KV.;Sonnenfeld A.;Michel P.;Behnke JF. .The barrier discharge: basic properties and applications to surface treatment[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,2003(3):417-436. |
[4] | Jean-Pascal Borra .[J].Journal of Physics D:Applied Physics,2006,39(02):R19. |
[5] | Jose N M;Prado L .[J].Quimica Nova,2005,28(02):281. |
[6] | Zhang Y H;Fu S Y;Li R K Y et al.[J].Journal of Computer Science and Technology,2005,65(11-12):1743. |
[7] | Xu W;Liang G;Zhai H et al.[J].European Polymer Journal,2003,39(07):1467. |
[8] | Descalzo A B;Martinez-Manez R;Sancenon R et al.Ange wandte[J].Chemie-International Ed,2006,45(36):5924. |
[9] | Celini N;Bergaya F;Poncin-Epaillard F .[J].Polymer,2007,48(01):58. |
[10] | Shaofeng Z;Yuedong M;Qiongrong O.[J].Plasma Sci Techn,2005(04):2955. |
[11] | Chirila V;Marginean G;Iclanzan T et al.[J].J Thermoplastic Comp Mater,2007,20(03):277. |
[12] | Felten A;Bittencourt C;Pireaux J J et al.[J].Journal of Applied Physics,2005,98(07):9. |
[13] | Zhu Feng;Eric Siu-Wai Kong;Zhang Jing et al.[J].Chemical Physics Letters,2006,423(4-6):270. |
[14] | Zhu F;Zhang J;Yang Z et al.[J].Physica E:Low-dimensional Systems and Nanostructures,2005,27(04):457. |
[15] | 徐世友,张溪文,韩高荣.介质阻挡放电常压化学气相沉积技术及其在薄膜制备中的应用[J].材料导报,2003(09):75-77. |
[16] | Okpalugo T I T;Papakonstantinou P;Murphy H et al.[J].Carbon,2005,43(14):2951. |
[17] | Jung S H;Park S M;Park S H et al.[J].Industrial and Engineering Chemistry Research,2004,43(18):5483. |
[18] | 何铁石;徐卫兵;周正发.[A].四川成都,2007:433. |
[19] | Lee Y H;Kyung S J;Jeong C H et al.[J].Japan J Appl Phy Part 2-Lett Express Lett,2005,44(1-7):L78. |
[20] | Lee Y H;Yeom G Y .[J].Japan J Appl Phys Part 1-Regular Papers Short Notes & Review Papers,2005,44(02):1076. |
[21] | Williamson JM;Trump D;Bletzinger P;Ganguly BN .Comparison of high-voltage ac and pulsed operation of a surface dielectric barrier discharge[J].Journal of Physics, D. Applied Physics: A Europhysics Journal,2006(20):4400-4406. |
[22] | 王伟,黄健,王晓琳.非常规低温等离子体处理技术及对聚合物膜材料表面的改性[J].材料导报,2005(z1):232-235. |
[23] | Hladik J;Spatenka P;Aubrecht L et al.[J].Czechoslovak Journal of Physics,2006,56:B1120. |
[24] | Arpagaus C;Rossi A;von Rohr PR .Short-time plasma surface modification of HDPE powder in a Plasma Downer Reactor - process, wettability improvement and ageing effects[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2005(5):1581-1595. |
[25] | Pichal J;Aubrecht L;Hladik J et al.[J].Czechoslovak Journal of Physics,2006,56:B1290. |
[26] | Guimond S;Radu I;Czeremuszkin G et al.[J].Plasmas and Poly-mers,2002,7(01):71. |
[27] | Roth J. R.;Nourgostar S.;Bonds T. A. .The One Atmosphere Uniform Glow Discharge Plasma (OAUGDP)—A Platform Technology for the 21st Century[J].IEEE Transactions on Plasma Science,2007(2):233-250. |
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