Spatial Potential Distribution around Trench Target during Plasma Immersion Ion Implantation

材料科学技术（英文）, 2003, 19(z1): 94-96.

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1.State Key Lab. of Welding Production Technology, School of Mater. Sci. & Eng., Harbin Institute of Technology, Harbin 15001, China;Department of Physics & Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong

2.State Key Lab. of Welding Production Technology, School of Mater. Sci. & Eng., Harbin Institute of Technology, Harbin 15001, China;Department of Physics & Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong

3.State Key Lab. of Welding Production Technology, School of Mater. Sci. & Eng., Harbin Institute of Technology, Harbin 15001, China;Department of Physics & Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong

4.State Key Lab. of Welding Production Technology, School of Mater. Sci. & Eng., Harbin Institute of Technology, Harbin 15001, China;Department of Physics & Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong

5.State Key Lab. of Welding Production Technology, School of Mater. Sci. & Eng., Harbin Institute of Technology, Harbin 15001, China;Department of Physics & Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong

基金项目: the National Natural Science Foundation of China(10345003) Hong Kong Research Grants Council (RGC) Competitive Earmarked Research Grants(CERG)(CityU 1013/01E or 9040577,CityU 1052/02E or 9040689)

Spatial Potential Distribution around Trench Target during Plasma Immersion Ion Implantation

Keywords： Plasma ion implantation

Plasma ion implantation, an alternative to conventional beam-line ion implantation, is a sheath-acceleration ionbombardment technique and the initial sheath is crucial to the process efficacy and surface properties. The initialspatial potential distributi

参考文献

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Spatial Potential Distribution around Trench Target during Plasma Immersion Ion Implantation

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