采用分段恒电位电沉积法在FTO导电玻璃上制备了CuInSe2 (CIS)薄膜.通过线性电位扫描分析了阴极的电化学反应,并通过电化学沉积法制备了CIS薄膜.结果表明,恒电位电化学沉积的薄膜与CIS的化学计量比相差较大,增加溶液中铟离子的浓度,可以提高铟在镀层的含量,使薄膜更接近CIS化学计量比.而采用分段恒电位法沉积薄膜,可以抑制铜硒化合物的生长,使薄膜更接近于CIS化学计量比.
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