基于微观相场模型模拟Ni-A1-V合金沉淀过程,研究合金中有序无序界面和异相间有序畴界的成分及其演化.研究表明,合金元素的偏聚和贫化与界面类型有关.在DO22相与无序相间的有序无序界面处,Ni和Al偏聚,V贫化;在Ll2相与无序相间的有序无序界面处,Ni和Al贫化,V偏聚;在异相间有序畴界处,V在界面的DO22相一侧贫化,在界面的L12相一侧偏聚;Al则在界面的DO22相一侧偏聚,在界面的L12相一侧贫化.Ni的成分分布与界面的形成方式有关.随着时间的进行,界面处合金元素的成分分布变得更加明锐,但合金元素的偏聚和贫化倾向不变.
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