研究了Ni在氨-碳酸铵溶液中有氧存在下的溶解动力学. 结果表明Ni的溶解过程主要是电化学溶解过程,但尚有Ni的氧化伴生.反应速度为氨控制区或氧控制区,这与氨和氧的浓度之比有关. 在NH_3控制区Ni表面易钝化生成氧化膜,并停止溶解;在氧控制区,Ni的溶解速度为氧在液膜中的扩散所控制,可由氧传递速度方程来表达.
Studies have been carried out on the kinetics of Ni dissolution in aqueoussolution of NH_3 and (NH_4)_2CO_3 with O_2 present. It is shown that the NH_3 andNH_4~+ salt dissolution of Ni is an electrochemical reaction accompanied by surfaceoxidation of Ni by O_2. The reaction rate may be either in the NH_3 concentrationcontrol region or in the O_2 concentration control region depending on the ratio ofthe concentration of NH_3 and that of O_2. In the NH_3 controlling region, the surface of Ni will be passivated rathereasily with the formation of oxide film. The dissolution reaction will then beinterrupted. In the O_2 controlling region, the rate of reaction will be controlled bythe rate of O_2 transfer through the liquid film around the Ni surface. It can becorrelated with the equation of the rate of O_2 mass transfer.
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