采用微波PCVD方法制备出直径50mm膜厚300um的大尺寸透明自支撑金刚石膜.在甲烷体积分数2%的条件下制备的透明自支撑金刚石膜经过两面抛光后在500cm-1-4000cm-1红外波段范同内红外透过率达到70%,但是其生长速率只有1um/h-2um/h.在体积分数4%甲烷浓度下制备的自支撑透明金刚石膜,其生长速率达到7um/h～8um/h,经过两面抛光之后膜厚为260um的金刚石膜的在500cm-1～4000cm-1红外波段范围内红外透过率达到60%左右,而且膜中心和边缘区的红外透过率基本相同.这些结果为大尺寸金刚石厚膜在红外窗口上的实际应用奠定了基础.
Large-sized free-standing transparent diamond films of 50 mm diameter and 300 um thickness were prepared by microwave plasma chemical vapor deposition (MWPCVD). The growth rate of the diamond film was only 1-2 um/h when the diamond film was grown at a methane concentration of 2%, and the infrared (IR) transmittance reached 70% in the range of 500-4000cm-1 after the film was polished on both sides. A high growth rate of 7-8 um/h was achieved for the film grown at a methane concentration of 4%. The thickness of the film was 260 um after it was polished on both sides and its IR transmittance in the range of 500-4000cm-1 reached about 60%. Meanwhile, the IR transmittance was almost the same in the central and fringe regions. These results imply a promising application of large-sized thick diamond films in IR windows.
参考文献
| [1] | Claude A.Klein .Diamond windows and domes: flexuralstrength and thermal shock[J].Diamond and Related Materials,2002(2):218-227. |
| [2] | 满卫东,汪建华,王传新,马志斌.金刚石薄膜的性质、制备及应用[J].新型炭材料,2002(01):62-70. |
| [3] | 满卫东.金刚石薄膜[J].新型炭材料,2002(02):77-77. |
| [4] | Zhong G.F. .Preparation of high quality transparent chemical vapor deposition diamond films by a DC arc plasma jet method[J].Diamond and Related Materials,2000(9-10Sep/Oct):1678-1681. |
| [5] | BI Xiang-xin .Optical properties of chemical vapor deposited diamond films[J].Journal of Materials Research,1990,5(04):811-815. |
| [6] | McNamara K M;Williams B E;Gleason K K et al.Identification of defects and impurities in chemical-vapor-deposited diamond through infrared spectroscopy[J].Journal of Applied Physics,1994,76(04):2466-2472. |
| [7] | I.Kiflawi;J.Bruley .The nitrogen aggregation sequence and the formation of voidites in diamond[J].Diamond and Related Materials,2000(1):87-93. |
| [8] | Dore P.;Cannavo D.;De Marzi G.;Calvani P.;Marcelli A. Sussmann RS.;Whitehead AJ.;Dodge CN.;Krehan AJ.;Peters HJ.;Nucara A. .Infrared properties of chemical-vapor deposition polycrystalline diamond windows[J].Applied optics,1998(24):5731-5736. |
| [9] | Yin Z;Akkerman Z;Yang B X et al.Optical properties and microstructure of CVD diamond films[J].Diamond and Related Materials,1997,6(01):153-158. |
| [10] | 吕宪义,金曾孙,杨广亮.用EA-CVD方法制备的大尺寸金刚石厚膜的品质和膜厚均匀性的研究[J].新型炭材料,2005(03):270-273. |
| [11] | Liya L. Regel;William R.Wilcox .Diamond film deposition by chemical vapor transport[J].Acta astronautica,2001(2/3):129-144. |
| [12] | Goodwin D G;Butler J E.Handbook of industrial diamonds and diamond films[M].New York:Marcel Dekker Lid,1996 |
| [13] | Gicquel A;Hassouni K;Silva F et al.CVD diamond films:from growth to applications[J].Current Applied Physics,2001,1:479-496. |
| [14] | May PW. .Diamond thin films: a 21st-century material[J].Philosophical transactions of the Royal Society. Mathematical, physical, and engineering sciences,2000(1766):473-495. |
| [15] | Stuart S A;Prawer S;Weiser P S .Growth-sector dependence of fine structure in the first-order Raman diamond line from large isolated chemical-vapor-deposited diamond crystals[J].Applied Physics Letters,1993,62(11):1227-1229. |
| [16] | Steven Prawer;Alon Hoffman;Sue-Anne Stuart et al.Correlation between crystalline perfection and film purity for chemically vapor deposited diamond thin films grown on fused quartz substrates[J].Journal of Applied Physics,1991,69(09):6625-6631. |
- 下载量()
- 访问量()
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%