采用非平衡分子动力学方法(NEMD)研究了平均温度为500 K、厚度为2~32 nm的单晶硅薄膜的法向热导率.模拟结果表明,薄膜热导率显著低于对应温度下的体硅单晶的实验值,并随膜厚度减小以接近线性的规律减小.用声子气动力论模型的分析结果与NEMD模拟相一致,表明纳米单晶硅薄膜中声子平均自由程显著减小.
参考文献
[1] | JU Y S;Goodson K E .Phonon-scattering in Silicon Films with Thickness of Order 100 nm[J].Applied Physics Letters,1999,74:05-3007. |
[2] | Volz S.;Lallemand M.;Perrin B.;Depondt P.;Mareschal M.;Saulnier JB. .TRANSIENT FOURIER-LAW DEVIATION BY MOLECULAR DYNAMICS IN SOLID ARGON[J].Physical Review.B.Condensed Matter,1996(1):340-347. |
[3] | FENG Xiaoli,Li Zhixin,LIANG Xingang,GUO Zengyuan.Molecular dynamics study on thermal conductivity of na-noscale thin films[J].科学通报(英文版),2001(07):604-607. |
[4] | FENG Xiao-li,LI Zhi-Xin,GUO Zeng-Yuan.Size Effect of Lattice Thermal Conductivity Across Nanoscale Thin Films by Molecular Dynamics Simulations[J].中国物理快报(英文版),2001(03):416-418. |
[5] | Balamane H;Halicioglu T;Tiller W A .Comparative Study of Silicon Empirical Interatomic Potentials[J].Physical Review B,1992,46:2250-2279. |
[6] | Stillinger F H;Weber T A .Computer Simulation of Lo cal Order iii Condensed Phases of Silicon[J].Physical Review B,1985,31(08):5262-5271. |
[7] | Ciccotti G;Tenenbaum A .Stationary Nonequilibrium States by Molecular Dynamics: Fourier's Law[J].Physical Review A,1982,25(05):2778-2787. |
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