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采用端羟基阳离子聚氨酯低聚物作为插层剂对钠基蒙脱土(MMT)进行有机改性,制备出羟基修饰的聚合物蒙脱土.将该改性活性有机蒙脱土(OMMT)作为增强体,制备出聚氨酯纳米片层粒子复合的杂化树脂.以封端型六亚甲基二异氰酸酯(HDI)三聚体为交联剂与上述复合树脂混合,经机械剪切、水乳化得到纳米杂化电泳树脂,经电泳工艺制备出聚氨酯漆膜,漆膜的耐化学腐蚀性得到改善.采用广角X射线衍射(WXRD)、傅里叶变换红外(FT-IR)、热重(TG)分析研究了新型有机蒙脱土的结构与性能.用透射电子显微镜(TEM)表征了杂化聚合物及有机蒙脱土的形态.同时研究了有机蒙脱土添加量对漆膜性能的影响.结果表明:钠基蒙脱土经端羟基阳离子聚氨酯改性后,其层间距由原来的1.309 nm扩大到2.154 nm,当其质量分数为0.3%时,电泳漆膜的耐酸性和耐水性得到较大的改善.

参考文献

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