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硼碳氮材料以其优异的机械、电学和光学性质,在工业领域、光电子领域等方面具有广阔的应用前景.对硼碳氮材料的研究进展作一综述,介绍了材料的结构特性、性质特点、制备方法、表征手段以及在器件方面潜在的应用.结合本实验研究小组的工作,阐述了硼碳氮材料的结构以及其高硬度特性.

参考文献

[1] Dong Ho Kim;Eungsun Byon;Sunghun Lee;Jong-Kuk Kim;Hyun Ruh .Characterization of ternary boron carbon nitride films synthesized by RF magnetron sputtering[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2004(1):192-196.
[2] Zhou Fei et al.Influence of deposition parameters on surface roughness and mechanical properties of boron nitride coating synthesized by ion beam assisted deposition[J].Thin Solid Films,2006,497:210.
[3] Gao R et al.Identification of ternary boron carbon nitrogen hexagonal phases by X-ray absorption spectroscopy[J].Applied Physics Letters,2001,78:3430.
[4] Gago R et al.Growth and characterization of boron carbon nitrogen coatings obtained by ion beam assisted evaporation[J].Vacuum,2004,64:199.
[5] Morant C;Prieto P;Bareno J;Sanz JM;Elizalde E .Hard BCxNy thin films grown by dual ion beam sputtering[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2006(1):207-211.
[6] Yu Jie et al.Turbostratie boron carbonitride film and its field-emitting behavior[J].Applied Physics Letters,1999,74:2948.
[7] 张生俊,陈光华,邓金祥,宋雪梅,邵乐喜.几种新型超硬薄膜的研究进展[J].物理,2001(10):622-627.
[8] Tomohiko Sugiyarna et al.Effect of annealing on dielectric constant of boron carbon nitride films synthesized by plasma-assisted chemical vapor deposition[J].Applied Physics Letters,2002,80:4214.
[9] Tomoyoshi Tai;Tomohiko Sugiyama;Takashi Sugino .Growth and characterization of boron carbon nitride films with low dielectric constant[J].Diamond and Related Materials,2003(3-7):1117-1121.
[10] Zhang Zhengjun et al.Wavelength-dependent effect of ultraviolet irradiation on dielectric constant of boron carbon nitride films[J].Journal of Applied Physics,2005,98:036105.
[11] Hidemitsu Aoki et al.Characterization of boron carbon nitride film modified by excimer laser annealing[J].Applied Surface Science,2007,565:0871.
[12] Tomohiko Sugiyama et al.Influence of the annealing process on properties of Cu/BCN/p-Si[M].Elsevier,2003,12:1113.
[13] Takashi Sugino;Yoshihiro Etou;Tomoyoshi Tai;Hirotaro Mori .Dielectric constant of boron carbon nitride films synthesized by plasma-assisted chemical-vapor deposition[J].Applied physics letters,2002(4):649-651.
[14] Tadao Yuki;Shuichi Umeda;Takashi Sugino .Electrical and optical characteristics of boron carbon nitride films synthesized by plasma-assisted chemical vapor deposition[J].Diamond and Related Materials,2004(4-8):1130-1134.
[15] Yao B et al.Formation,characterization and properties of a new boron carbon nitride crystal[J].Journal of Applied Physics,1999,86:2464.
[16] Zhi C Y et al.Raman characterization of boron carbonitride nanotubes[J].Applied Physics Letters,2002,80:3590.
[17] Yu J et al.Semiconducting boron carbonitride nanostructures:Nanotubes and nanofibers[J].Applied Physics Letters,2000,77:1949.
[18] Bai X D et al.Blue-violet photoluminescence from largescale highly aligned boron earbonitride nanofibers[J].Applied Physics Letters,2000,77:67.
[19] Lei M K et al.Characterization and optical investigation of BCN film deposited by RF magnetron sputtering[J].Thin Solid Films,2001,389:194.
[20] Bejarano G et al.Deposition of B4C/BCN/c-BN multilayered thin films by r.f.magnetron sputtenring[M].Elsevier,2006,494:53.
[21] Kurapov D et al.Synthesis and mechanical properties of BCN coatings deposition by PECVD[J].Vacuum,2003,68:335.
[22] Thamm T;Korner KU;Bohne W;Strub E;Rohrich J;Stockel S;Marx G .Characterization of PECVD boron carbonitride layers[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2005(1):223-226.
[23] Zhi C Y et al.Resonance scattering of boron carbonitride nanotubes[J].Applied Physics Letters,2004,84:1549.
[24] Stockel S.;Weise K.;Dietrich D.;Thamm T.;Braun M.;Cremer R. Neuschutz D.;Marx G. .Influence of composition and structure on the mechanical properties of BCN coatings deposited by thermal CVD[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2002(0):465-471.
[25] Safran G et al.Modulated CNx films prepared by IBAD[J].Diamond and Related Materials,2002,11:1552.
[26] Riviere J P et al.Formation of the crystalline β-C3 N4 phase by dual ion beam sputtering deposition[J].Materials Letters,2007,61:2855.
[27] Takashi Sugino;Yoshihiro Etou;Tomoyoshi Tai;Hirotaro Mori .Dielectric constant of boron carbon nitride films synthesized by plasma-assisted chemical-vapor deposition[J].Applied physics letters,2002(4):649-651.
[28] Yoke Khin et al.Hybridized boron-carbon nitride fibrous nanostruetures on Ni substrates[J].Applied Physics Letters,2002,80:2559.
[29] 王洪霞,米卫红,高岩,郝策.硼氮纳米管研究进展[J].化学研究,2003(03):58-63.
[30] Yao B et al.Formation,characterization,and properties of a new boron carbon nitride crystal[J].Journal of Applied Physics,1999,86:2464.
[31] Haruyuki Yasui et al.The properties of BCN films formed by ion beam assisted deposition[J].Colloids and Surfaces B:Biointerfaces,2000,19:291.
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