采用Ti靶和Al2O3 靶在Ar、N2混合气氛中进行反应磁控溅射的方法，制备了一系列不同AlON层厚度的TiN/AlON纳米多层膜，利用X射线能量色散谱仪、X射线衍射仪、高分辨透射电子显微镜和微力学探针研究了AlON的形成条件以及AlON调制层厚的改变对多层膜微结构和力学性能的影响。结果表明，在Ar 、N2混合气氛中对Al2O3进行溅射，N原子会部分取代Al2O3中的O原子，形成非晶态的AlON化合物。在TiN/AlON纳米多层膜中，由于TiN晶体层的模板效应，AlON层在厚度小于 0.6 nm时被强制晶化并与TiN形成共格外延生长结构，多层膜显示出最高硬度达40.5 GPa的超硬效应。进一步增加AlON的层厚，其生长模式由晶态向非晶态转变，破坏了多层膜的共格外延生长结构，多层膜的硬度随之降低。
Ti and Al2O3 targets are used to prepare a series of TiN/AlON nanomultilayers in the gas mixture of Ar and N2 with reactive magnetron sputtering method. The formation conditions of AlON and the effects of thickness of AlON on microstructures and mechanical properties of the multilayers are evaluated and characterized by X-ray energy dispersive spectroscopy, X-ray diffraction, high resolution transmission electron microscopy and nanoindentation. The investigations show that O atom in Al2O3 will be partially replaced with N atom when sputtering Al2O3 target in the gas mixture of Ar and N2, forming amorphous AlON. In TiN/AlON nanomultilayers, when thickness of AlON is less than 0.6nm, AlON, due to the template effect of TiN crystal layer, is forced to crystallize and grow epitaxially with TiN, and the multilayers begin to show superhardness effect with a highest Hv value of 40.5GPa. With further increase of the thickness of AlON, its growth mode changes from crystal to amorphous, therefore destroying the epitaxial structure of multilayeres and leading to a decreased hardness of multilayers.
参考文献
| [1] | |
| [2] | |
| [3] | |
| [4] |
- 下载量()
- 访问量()
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%