γ-TiAl合金表面磁控溅射与电弧离子镀制备Al涂层高温氧化行为的比较

稀有金属材料与工程, 2014, 43(11): 2652-2656.

γ-TiAl合金表面磁控溅射与电弧离子镀制备Al涂层高温氧化行为的比较

徐一 ^1, , 缪强 ^2, , 梁文萍 ^3, , 王玲 ^4, , 于修水 ^5, , 任蓓蕾 ^6, , 姚正军 ^7,

1.南京航空航天大学,江苏南京210016

2.南京航空航天大学,江苏南京210016

3.南京航空航天大学,江苏南京210016

4.南京航空航天大学,江苏南京210016

5.南京航空航天大学,江苏南京210016

6.南京航空航天大学,江苏南京210016

7.南京航空航天大学,江苏南京210016

基金项目: National Natural Science Foundation of China (51174119) the Fundamental Research Funds for the Central Universities and the Aeronautical Science Foundation of China (2012ZF52071) the Funding of Jiangsu Innovation Program for Graduate Education (CXZZ12_0149)

关键词：磁控溅射 , 电弧离子镀 , Al涂层 , 抗氧化性能

A Comparison of Oxidation Behavior of Al Coatings Prepared by Magnetron Sputtering and Arc Ion Plating on γ-TiAl

Keywords： magnetron sputtering , arc ion plating , Al coating , oxidation resistance

利用XRD、EDS和SEM分析研究了磁控溅射和电弧离子镀2种工艺制备的Al涂层的微观结构、形貌和抗氧化性能.磁控溅射技术制备的均匀、致密的Al层拥有更为细小的晶粒组织.在氧化实验后,磁控溅射制备的Al涂层形成了一个由表层氧化层、次表层富Al层和互扩散层的保护性结构.相比之下,电弧离子镀制备的Al涂层表现出了更差的抗氧化性.这是由于在离子镀制备的Al涂层中发现的针孔可以为氧气的侵入提供通道,从而引起涂层的内氧化并最终导致涂层的剥离.结果表明,磁控溅射制备Al涂层具备更好的抗高温氧化性能.

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