通过研究基片种类、加热温度、保温时间、冷却速度及是否加入催化剂等不同工艺参数对低维Ga2O3纳米材料形貌的影响,确定出合成5种不同形貌β-Ga2O3纳米材料的工艺条件.场发射扫描电镜(FE-SEM)表明5种不同形貌β-Ga2O3纳米材料分别为纳米线、纳米棒、纳米带、纳米环及纳米片.X射线衍射(X-ray)分析结果表明不同形貌纳米材料均为晶格常数α=1.223 nm,b=0.304 nm,c=0.58 nm,α=90°,β=103.7°,γ=90°的单斜晶系β-Ga2O3晶体.
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