采用阴极微弧电沉积在钛表面生成了厚度达100μm的氧化铝涂层,研究了不同电压下涂层的结构和组成,分析了涂层的生长规律和形成过程.结果表明:阴极微弧电沉积过程包括火花前、微弧和局部弧光三个阶段,期间伴随有Al(NO3)3的离解、Al(OH)3的沉积与高温烧结等反应,微弧区产生的高温高压是形成Al2O3涂层的关键.涂层主要由γ-Al2O3和α-Al2O3组成,随电压升高,α-Al2O3的含量逐渐增加,在400V时其含量达76%.
An alumina coating with a thickness of 100μm on a titanium substrate was prepared by cathodic micro-arc electrodeposition. The microstructures and phase compositions
of the coating at different voltages were studied, and the growth mechanism of the coating was analyzed. The results show that the coating grows by
the following steps: the stage of no electric spark, micro-arc discharge and local arc light. In these courses Al(NO3)3 is dissociated and Al(OH)3
is deposited and dehydrated. The high temperature and pressure produced in micro-arc area are keys to the formation of the alumina coating. The coating
is mainly composed of γ-Al2O3 and α-Al2O3. The content of α-Al2O3 is increased with increasing voltage, which
amounts to 7% at 400V.
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