利用微波等离子体化学气相沉积(MPCVD)方法,在附着有催化剂的石墨片衬底上原位沉积了碳纳米管膜电极.通过正交设计方法综合研究了反应温度、镍膜厚度、沉积时间、甲烷流量对碳纳米管膜电化学性能的影响.结果表明:不同条件下制备的碳纳米管膜的电化学性能有很大差异,其中起主要作用是甲烷流量和反应温度.保持工作压强(6.5×103 Pa)和氢气的流量(100 sccm)不变,温度为700~800 ℃时,甲烷流量为5 sccm,Ni膜厚度为150 nm,生长时间为5 min,所得碳纳米管膜电极电化学性能最佳,氧化峰电流最大,达到14 nA.
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