以发生了二次再结晶的高纯Al为衬底材料,采用射频磁控溅射法制备了ZnO薄膜.研究了溅射工艺及Al衬底取向对ZnO薄膜的影响,分析了Al衬底取向与ZnO薄膜织构的关系.结果显示,当溅射工艺恰当时,高纯Al衬底上可以制备出晶态ZnO薄膜,但Al衬底的取向对ZnO薄膜的结晶性具有更大的影响.Al衬底的轧面上主要为{100}面织构,沉积的ZnO薄膜主要是{0002}面织构和少量的{1120}面织构组分.
参考文献
| [1] | Ashrafi A;Jagadish C .Review of zincblende ZnO: Stability of metastable ZnO phases[J].Journal of Applied Physics,2007(7):071101-1-071101-12-0. |
| [2] | 许恒星,王金良,唐宁,彭洪勇,范超.ZnO压电薄膜的制备与性能表征[J].人工晶体学报,2009(04):880-883. |
| [3] | U. Ozgur;Ya. I. Alivov;C. Liu;A. Teke;M. A. Reshchikov;S. Dogan;V. Avrutin;S.-J. Cho;H. Morkoc .A comprehensive review of ZnO materials and devices[J].Journal of Applied Physics,2005(4) |
| [4] | Mohamed SH .Effects of Ag layer and ZnO top layer thicknesses on the physical properties of ZnO/Ag/Zno multilayer system[J].The journal of physics and chemistry of solids,2008(10):2378-2384. |
| [5] | H. Frenzel;A. Lajn;H. von Wenckstern;G. Biehne;H. Hochmuth;M. Grundmann .ZnO-based metal-semiconductor field-effect transistors with Ag-, Pt-, Pd-, and Au-Schottky gates[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2009(4):1119-1123. |
| [6] | Yoon KH.;Lee DH.;Choi JW. .CHARACTERISTICS OF ZNO THIN FILMS DEPOSITED ONTO AL/SI SUBSTRATES BY RF MAGNETRON SPUTTERING[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1997(1/2):116-121. |
| [7] | Wen-Ching Shih;Tzyy-Long Wang;Yan-Kai Pen .Enhancement of characteristics of ZnO thin film surface acoustic wave device on glass substrate by introducing an alumina film interlayer[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2012(14):5424-5428. |
| [8] | Ye ZZ;Yuan GD;Li B;Zhu LP;Zhao BH;Huang JY .Fabrication and characteristics of ZnO thin films with an Al/Si (100) substrates[J].Materials Chemistry and Physics,2005(1):170-173. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%