研究长波长InAsSb半导体材料在退火处理前、后,傅里叶变换红外(FTIR)透射光谱、组份元素In、Sb和As在外延层中的分布以及电学性质的变化.用熔体外延(ME)技术,在InAs衬底上生长InAs0.05Sb0.95外延层,外延层的厚度达到100 pm.在350℃下,在氢气氛中对样品进行了11h的退火.测量结果表明,退火处理使InAsSb样品的电子迁移率从300 K下的43600 cm2/(V·s)提高到77 K下的48300 cm2/(V·s),材料的电学性能及元素分布均匀性得到了明显改善.
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