材料期刊网

Ti-B-N films were deposited on W18Cr4V high speed steels by using N ion bombardment on an electron beam ion plated Ti-B film. Scanning electron microscopy and transmission electron microscopy morphology of the samples shows that the films are found to have a dense and fine nanocrystalline structure, and a dense close interface bonding exists between the film and the substrate. Auger electron spectroscopy depth profiling analysis of the film indicates that N and Ti penetrate into the substrate, resulting in a wide interfacial diffusion zone, which is about 150 nm. Microdiffraction patterns of the interface show that FeTi, Fe2Ti, and Ti2N phases exist in the interfacial diffusion zone. The results obtained indicate that the method of bombarding the him by N ions extends the film-substrate interfacial diffusion zone and stimulates the interfacial chemical reaction.