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为了研究低速高电荷态离子在C60薄膜中引起的势效应,用能量为200 keV的高电荷态Xen+(n=3,10,13,15,17,20,22,23)离子辐照了C60薄膜.用原子力显微镜(AFM)和Raman散射技术分析了辐照过程中高电荷态Xen+离子所储存势能在C60薄膜中引起的效应,即势效应.AFM分析结果表明,辐照C60薄膜的表面粗糙度随辐照Xen+离子电荷态(即势能)的增加而减小,揭示了势效应的存在.而Raman分析结果表明,由于Xe离子的动能远大于其所储存的势能,因此,尽管有表面势效应的影响,但在Raman分析的深度范围内,弹性碰撞还是主导了C60薄膜的损伤过程.

参考文献

[1] Kr(a)tschmer W,Lamb L D,Fostiropoulos K,et al.Nature,1990,347,354.
[2] Hebard A F,Roseeinsky M J,Haddon R C,et al.Nature,1991,350:320.
[3] Find D,Klett R,Szimkoviak P,et al.Nucl Instr & Meth,1996,B108:114.
[4] Kastner J,Kuzmany H,Palmetshofer L.Appl Phys Lett,1994,65:543.
[5] Borisov A M,Mashkova E S.Nucl Instr & Meth,2007,13258:109.
[6] Aumayr F,El-Said A S,Meissl W.Nucl Instr & Meth,2008,B266:2729.
[7] Rhee J H,Byeongchul H,Sharma,Thin Solid Films,2008,517:522.
[8] Saha S K,Chowdhury D P,Das S K,et al.Nucl Instr Meth,2006,B243:277.
[9] Murty M V R.Surf SCi,2002,500:523.
[10] Schenkel T,Barnes A V,Hamza A V,et al.Phys Rev Lett,1998,80:4325.
[11] Gillaspy J D,Parks D C,Ratliff L P.J Vac Sci Techn,1998,B80:3294.
[12] Hoffmann D H H,Weyrich K,Wahl H,et al.Phys Rev,1999,A42:2313.
[13] Aumayr F,Winter H P.Nucl Instr & Meth,2005,B233:111.
[14] Aumayr F,Kurz H,Schneider D,et al.Phys Rev Lett,1993,71:1943.
[15] Jin Yunfan,Yang Ru,Wang Yanhin,et al.Nuclear Physics Review,2000,17(3):134(in Chinese).(金运范,杨茹,王衍斌等.原子核物理评论,2000,17(3):134.)
[16] Dresselhaus M S,Dresselhaus G,Eklund P C.J of Raman Spec,1996,27:351.
[17] Jin Y F,Yao C F,Wang Z G,et al.Nucl Instr & Meth,2005,B230:565.
[18] Fu Y C,Jin Y F,Yao C F,et al.Chin Phys Lett,2009,26:016101.
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