在SPF-430H溅射系统上采用不加偏压的射频磁控溅射法制备了TbCo非晶垂直磁化膜,并就Cr底层对TbCo非晶垂直磁化膜磁性能的影响进行了研究.结果表明,Cr底层的存在能够增强TbCo非晶垂直磁化膜的磁各向异性,并使得其矫顽力增加.分别采用VTBH-1型高感度振动样品磁强计和MTL-1磁转矩系统测量了TbCo薄膜的磁滞回线和磁转矩曲线.结果发现,厚度为120 nm,并带有180 nm厚度Cr底层的Tb31C69薄膜的矫顽力和磁各向异性能分别高达51.2×104 A/m和0.457 J/cm3;没有带Cr底层的同样厚度的Tb31C69薄膜的矫顽力和磁各向异性能分别只有35.2×104 A/m和0.324 J/cm3.Hitachi X-650型扫描电镜的观测结果表明,带有Cr底层的TbCo薄膜具有柱状结构,这一柱状结构导致了磁各向异性能的增强以及矫顽力的提高.
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