采用化学染色腐蚀法在Co(NO3)2和HF酸组成的腐蚀液中制备了钴钝化多孔硅,其表面形貌由垂直于表面分布的尺度为0.5～1.5μm的硅尖组成,部分硅尖顶端还有0.1～0.5μm的圆形孔洞,硅尖的面密度约为1.0×108个/cm2,多孔硅层厚度约为2μm.XPS分析结果表明,钴原子仅存在于多孔硅表面非常薄的一层内.其场发射具有较好的可靠性和可重复性,开启场强一般为2.3V/μm左右,场强为5.4V/μm时,亮点均匀而且密集,发射电流密度达到30μA/cm2左右.
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