集成电路薄膜工艺的新进展--化学液相淀积

材料导报, 2003, 17(10): 78-79.

1.中国科学院半导体研究所半导体材料科学实验室,北京,100083

2.山东大学外国语学院,济南,250100

Chemical Liquid Phase Deposition:A New Development in Manufacturing Technology for Thin Films Used in Integrated Circuits

介绍了化学液相淀积法制备氧化物薄膜的工艺过程及其在集成电路生产中的应用,并报道了一些最新研究成果.

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