CORROSION BEHAVIOR OF Cu-Nb AND Ni-Nb AMORPHOUS FILMS PREPARED BY ION BEAM ASSISTED DEPOSITION

金属学报(英文版), 2003, 16(4): 266-270.

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1.Laboratory of Advanced Materials, Department of Materials Science and Engineering, Tsinghua University,Beijing 100084, China

2.Laboratory of Advanced Materials, Department of Materials Science and Engineering, Tsinghua University,Beijing 100084, China

3.Laboratory of Advanced Materials, Department of Materials Science and Engineering, Tsinghua University,Beijing 100084, China

4.Laboratory of Advanced Materials, Department of Materials Science and Engineering, Tsinghua University,Beijing 100084, China

基金项目: 国家自然科学基金(19875027) 清华大学校科研和教改项目科技部资助项目(G2000067207-1)

CORROSION BEHAVIOR OF Cu-Nb AND Ni-Nb AMORPHOUS FILMS PREPARED BY ION BEAM ASSISTED DEPOSITION

Keywords： amorphous film

The Cu25Nb75 and Ni45Nb55 amorphous films with about 500nm thickness were prepared by ion beam assisted deposition (IBAD). Potentiodynamic polarization measurement was adopted to investigate the corrosion resistance of samples and the tests were carried out respectively in 1mol/L H2SO4 and NaOH aquatic solution. The corrosion performance of the amorphous films was compared with that of multilayered and pure Nb films. Experimental results indicated that the corrosion resistance of amorphous films was better than that of the corresponding multilayers and pure Nb films for both Ni-Nb system with negative heat of formation and Cu-Nb system with positive heat of formation.

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CORROSION BEHAVIOR OF Cu-Nb AND Ni-Nb AMORPHOUS FILMS PREPARED BY ION BEAM ASSISTED DEPOSITION

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