以自制铈掺杂立方相钇铝石榴石(YAG:Ce3+)荧光粉为原料经冷静压压制得到粉末靶材,在纯氩气气氛下通过射频磁控溅射法在石英玻片上镀膜,随后在氩气气氛下1100℃/3 h热处理得到YAG:Ce3+荧光薄膜.系统探讨了溅射功率、靶间距等因素对YAG:Ce3+荧光薄膜物理和发光性能的影响.分析发现采用粉末靶可以明显提高YAG:Ce3+薄膜溅射沉积速率,在靶间距20mm,溅射功率300 W的制备条件下得到的荧光薄膜经450 nm蓝光激发时,可发射524 nm的光,较商用荧光粉发射峰略有蓝移.粉末靶溅射制备荧光薄膜具有大规模实际应用潜力.
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