This article gives a brief introduction to manufacturers and markets of sputtering targets as well as the manufacturing technology thereof.Then,it analyzes the application of high-purity gold sputtering targets in the fields of integrated circuit,information storage,flat panel display,etc.Based on the above,the article analyzes the processing development trend for the high-purity gold sputtering targets in aspects of ultra-high purity,manufacturing technology,analysis and testing technologies.
参考文献
[1] | Zhou Qin;Gu Jianzhong;Zhou Hongli .Development of chrom-silicon sputtering targets in foreigh countries[J].Journal of Shanghai Iron and Steel Research,1992,2:66-69. |
[2] | Qu Xixin;Yang Bangchao.Electronic Film Materials[M].北京:科学出版社,1996 |
[3] | Tian Minbo;Liu Deling.Film Science and Technical Manual[M].北京:机械工业出版社,1992 |
[4] | Lo Chi;Fung D D.Method for Fabricating Randomly Oriented Aluminum Alloy Sputtering Targets with Fine Grains and Fine Precipitates[M].The United States,1999:11-30. |
[5] | Wu Lijun .Sputtering targets in the development[J].Journal of Vacuum Science and Technology,2001,4:342-347. |
[6] | Yang Bangchao;Cui Hongling .Manufacturing and application of sputtering targets[J].Journal of Vacuum Science and Technology,2001,3:11-15. |
[7] | Yu Zehai;Sun Peng;Wang Chunping et al.Development and status quo of high-purity copper sputtering targets[J].Shanxi Metallurgy,2007,5:4-6. |
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