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This article gives a brief introduction to manufacturers and markets of sputtering targets as well as the manufacturing technology thereof.Then,it analyzes the application of high-purity gold sputtering targets in the fields of integrated circuit,information storage,flat panel display,etc.Based on the above,the article analyzes the processing development trend for the high-purity gold sputtering targets in aspects of ultra-high purity,manufacturing technology,analysis and testing technologies.

参考文献

[1] Zhou Qin;Gu Jianzhong;Zhou Hongli .Development of chrom-silicon sputtering targets in foreigh countries[J].Journal of Shanghai Iron and Steel Research,1992,2:66-69.
[2] Qu Xixin;Yang Bangchao.Electronic Film Materials[M].北京:科学出版社,1996
[3] Tian Minbo;Liu Deling.Film Science and Technical Manual[M].北京:机械工业出版社,1992
[4] Lo Chi;Fung D D.Method for Fabricating Randomly Oriented Aluminum Alloy Sputtering Targets with Fine Grains and Fine Precipitates[M].The United States,1999:11-30.
[5] Wu Lijun .Sputtering targets in the development[J].Journal of Vacuum Science and Technology,2001,4:342-347.
[6] Yang Bangchao;Cui Hongling .Manufacturing and application of sputtering targets[J].Journal of Vacuum Science and Technology,2001,3:11-15.
[7] Yu Zehai;Sun Peng;Wang Chunping et al.Development and status quo of high-purity copper sputtering targets[J].Shanxi Metallurgy,2007,5:4-6.
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