采用自组装技术在黄铜表面分别制备γ-巯基丙基三甲氧基硅烷(PropS-SH)、十二烷基三甲氧基硅烷(DTMS)、氨基丙基三甲氧基硅烷(APS)和γ-氯丙基三甲氧基硅烷(CPTMS)自组装膜,并分别采用电化学极化法、接触角测试和傅里叶红外光谱研究硅烷膜的耐蚀性、疏水生和结构.结果表明:经PropS-SH、DTMS和CPTMS硅烷化处理后,黄铜的耐蚀性均有提高.PropS-SH在黄铜表面形成化学吸附,同时Si-O-Si以交联形式形成硅烷膜,阻碍了溶解氧向电极表面扩散,故耐蚀性最优,黄铜经PropS-SH硅烷化后,在质量分数为3.5％的NaCl溶液中的腐蚀电流密度为0.2 μA/cm2,缓蚀效率达到97.4％.
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