<正> 近年来对Al的氧吸附和氧化已有大量研究,相比之下,对较重的三价金属In的氧吸附研究甚少.本文用CLS(特征能量损失谱)和AES(Auger电子谱)研究了氧在In表面的吸附及氧化.实验在ESCALAB-5型电子谱仪上进行.
The adsorption of oxygen and initial stages of oxidation on clean In surface were studied using CLS and AES. It was observed that the oxygen was already absorbed on the surface at low oxygen exposure down to 10~(-2)LO_2. A monolayer oxide on In can be found at exposure of 10~2LO_2 and a continuous metal free thicker oxide layer at 10~3LO_2, then a fast adsorption stage is followed by a slower one after 10~3LO_2
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