The sputtering rates of alloys were investigated under constant Ar pressure and voltage supplied.The alloys studied in this work range from binary intermetallic alloys to ternary and quaternary alloys. It is revealed that the sputtering rates of alloy targets under steady states are where q is the sputtering rates of alloys, Ci the weight percentage of i-th component in the alloy,and qi0 the sputtering rate of pure metal of i-th component.
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